Application
1.Rapid Thermal Annealing,ion implantation annealing
2.Graphene CVD preparation, nanotube growthing
3.Rapid thermal oxidation,Rapid thermal Nitriding
4.Silicidation,diffusion,contact alloying,crystallization and densification

Model No.  | CY-O1200-50IRTP  | 
Display  | 7” LCD Touch Panel  | 
Limiting temperature  | 1150℃  | 
Working temperature  | ≤1100℃  | 
Heating rate  | 0-100℃/min  | 
Heating Zone length  | 400mm, constant temperature zone200mm  | 
Corundum tube diameter  | OD50*1200mm  | 
Temperature accuracy  | ± 1℃  | 
Heating element  | Alchrome  | 
Thermal couple  | K TYPE  | 
Cooling method  | Double layer structure with fan cooling  | 
Temperature control  | 30 steps programmable PID control  | 
Chamber material  | Alumina fiber  | 
Over-temperature alarm  | Yes  | 
Over-current alarm  | Yes  | 
Sealing flange  | S.S vacuum flange  | 
Sliding method  | Manual sliding  | 
Cooling method  | air forced cooling  | 
Gas mixer  | One way with Float Flow Controller  | 
Main Power  | 4.5Kw  | 
Working voltage  | AC220V,50Hz  | 
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